Fully-Automatic Photoresist Coating and Developing

PicoTech offers a wide range of Fully-Automatic Photoresist Coating and Developing tools by Suss MicroTec.

SUSS MicroTec’s Fully-Automatic Photoresist Coating and Developing tools are made especially for production purposes and optimized for maximum throughput. Systems can be custom configured for each application and offer unmatched configuration flexibility of modules and technologies. Supported wafer sizes are up to 200mm or 300mm.

 

Typical applications are:

Photoresist Coating, Photoresist Developing (puddle or spray) for Advanced Packaging, MEMS, LED, and other markets and serving R&D as well as high volume manufacturing.