PicoTech offers a full range of Laboratory and Production Wet Benches for Wet Cleaning, Wet Etching, Lift-off and Electroplating processes. The portfolio of machines includes manual, semi-automatic and fully automatic Wet Benches for R&D and Production purposes. Machines can accommodate samples from small pieces up to 300mm wafers for all types of wet processing. Manual Laboratory Wet Benches can be also equipped with additional tools for Photoresist Coating, Developing, Drying and Baking as well as for Spin Rinse Drying (SRD) of wafers.

Typical applications are:

Wet Cleaning, Electroplating, Wet Etch, Lift-Off, Drying, Photoresist Coating and Developing, Spin Rinse Drying (SRD) and many others.