PicoTech offers a wide range of Electron Beam Lithography tools by Elionix for both R&D and production purposes. These systems can be configured for versatile tasks of R&D and also for higher throughput automated production. The Elionix product line enables writing in E-Beam resists at extremely high resolution and with the highest stitching accuracy.
Electron Beam Lithography tools can operate with acceleration voltages of 30kV, 50kV, 100kV, 125kV, 150kV depending on the application. Such tools are capable of writing areas up to 300x300mm (300mm wafers, as well as 9 inch masks) with a feature size of several nanometers.
Moreover, PicoTech offers Electron Beam Lithography as an option inside its line of Scanning Electron microscopes (SEMs) and Focused Ion Beam (FIBs) from Tescan. Such E-Beam Lithography options are very easy and intuitive for the operator and enable the writing of E-Beam resists at surprising high resolution.
