PicoTech offers a full range of plasma tools for Plasma Enhanced Chemical Vapor Deposition (PECVD). This technology includes conventional and low temperature PECVD, PECVD on very large area wafers and substrates. Many different platforms and product families are presented in this section. A variety of plasma systems allows to cover all PECVD related tasks on every level starting from R&D and up to a full-scale manufacturing.

Typical applications are:

Conventional PECVD, Low-Temperature PECVD, Large Area PECVD, PECVD with TEOS. Manual and semi-automatic Plasma Systems can accommodate sample sizes from small pieces up to 300mm wafers. Samples can be handled one by one or in batches.