PicoTech offers a full range of equipment in the field of Photolithography, Electron-Beam Lithography and Maskless Lithography for Semiconductor and Nano Technology. The portfolio of machines includes manual, semi-automatic and fully automatic tools for R&D and production purposes. The systems can accommodate substrates from small pieces to 300mm wafers and even larger substrates. We have a very big install base and knowledge of Lithography equipment in Israel which we service on a daily basis.

The list of technologies includes:

Photoresist Spin Coating and Spray Coating of Photoresist, Photoresist Development, Photoresist Drying and Baking, Contact and Proximity Mask Aligners, Nanoimprint, Electron-Beam Lithography, and Maskless Lithography such as Laser Direct Writers, Wafer Bonding.