PicoTech offers a full range of equipment for photoresist processing, including: Spin Coaters, Spray Coaters, Photoresist Developers, Mask Cleaners and Etchers, Hotplates and many others. The portfolio of machines includes manual, semi-automatic and fully automatic tools for R&D and Production purposes. Machines can accommodate samples from small pieces up to 300mm wafers for all types of wet processing.

Typical applications are:

Photoresist Spin Coating and Developing, Lift-Off, Photoresist Spray Coating, Mask Cleaning and Mask Etching, Photoresist Drying and Baking. Manual machines can accommodate sample sizes from small pieces up to 200mm. Production type cluster tools can accommodate sample sizes from 100mm up to 300mm. Samples can be handled one by one or in cassettes. We also offer systems for Electron Beam Resist (E-Beam Resist).