Laser Maskless Lithography for R&D

PicoTech offers a wide range of Laser Maskless Lithography tools for R&D. Compact table-top Laser Maskless Lithography tools allow to work with resolutions down to 0.3um on wafers up to 150mm in size.

Different models are available for resolutions: 0.3um, 0.6um, 0.8um, 1.5um, 2um; which makes it very easy to select an appropriate tool for R&D laboratory in accordance with the technology task and available budget.

Maskless lithography enables nanopatterning at will, without the need for slow and expensive photomasks. This convenience is especially useful for research and rapid prototyping use.