PicoTech offers a wide range of UV LED Exposure Systems for R&D. Compact table-top UV illumination systems are based on the use of high-power LEDs and high-grade homogenization optics. Standard line of UV illumination products addresses photolithography needs for masks and wafers up to 300 mm wide (11.8 inches).
UV LED Exposure Systems may be equipped with a single wavelength source, for example, 365 nm or multiple peak wavelengths can be combined (365 nm , 405 nm and 435 nm) to mimic the UV-A spectrum of mercury-arc lamps (i-line, h-line and g-line).
Main applications are: Photoresist Exposure (UV-LED photolithogaphy and curing), MEMS, microfluidics, photonics, semiconductors and photovoltaic.
