Manual Photoresist Spin Coating, Developing, Cleaning, Etching

PicoTech offers a wide range of laboratory Spin Coaters by Suss MicroTec for photoresist coating and developing, cleaning and etching processes.

SUSS MicroTec spin coaters have become synonymous with premium performance, ease of use, flexibility, and enhanced coating mastery.  SUSS MicroTec coaters and developers enable the formation of resist layers ranging from below 1 µm to over 500 µm. Laboratory Spin Coat and Develop Solutions support wafers up to 150 and 200mm.

A variety of photolithography chemicals can be used for uniform, precise and repeatable spin coating results.