Thermal ALD for R&D

PicoTech offers a wide range of Thermal ALD Systems for R&D.

Thermal ALD Systems for R&D are simple, affordable and robust solution for university researchers and start-ups worldwide. Efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.

A variety of materials is possible with Thermal ALD:

Oxides

Al2O3, HfO2, SiO2, TiO2, SrTiO3, Ta2O5, Gd2O3, ZrO2, Ga2O3, V2O5, Co3O4, ZnO, ZnO:Al, ZnO:B, In2O3:H, WO3, MoO3, Nb2O5, NiO, MgO, RuO2

Nitrides

TiN, TaN, Si3N4, AlN, GaN, WN, HfN, NbN, GdN, VN, ZrN

Metals

Pt, Ru, Pd, Ni, W

Fluorides

MgF2, AlF3

Organic Materials

Alucone

Sulfides

ZnS, MoS2