PicoTech offers a wide range of GaN MOCVD tools for Power, 5G RF, Photonics and CMOS by Veeco.
Veeco’s Propel™ HVM GaN MOCVD System is designed as a unique, high volume manufacturing single wafer reactor cluster system for GaN-based Power, RF and photonics devices. Featuring a single-wafer reactor platform, capable of producing best-in-class high quality epitaxy film performance on 150 and 200mm wafers for exceptional uniformity, repeatability and yield.
Fully Automated, Single Wafer Cluster System Enables Production 5G RF, Photonics and advanced CMOS Devices on 300mm Substrates. The Propel™ 300mm fully automated single wafer cluster system is the only industry proven GaN MOCVD tool that enables production of 5G RF, Photonic and advanced CMOS devices on 300mm substrates. Featuring a single-wafer reactor platform, the Propel 300mm system is capable of producing best-in-class, high quality epitaxy films on 300mm wafers with exceptional uniformity, repeatability and yield. The Propel 300mm System is configurable with up to 3 modular cluster chambers and offers automated cassette to cassette handling for maximum flexibility and productivity.
