PicoTech offers a wide range of laboratory Manual RIE tools for basic Reactive Ion Etching (RIE) processes.
Compact and easy to use, Versatile Manual RIE tools are typically used by universities and small laboratories for R&D and pilot production. These tools are simplified reactive ion etching platforms for less demanding applications with lower process uniformities.
Such systems can be equipped with water cooled RIE electrodes of 8″ or 12″ in the open load configuration without load lock. This allows to process samples with reactive ion etching technology (RIE) in gases and gas mixtures, for example: Ar, CF4, SF6, O2.
Typical applications are:
General purpose RIE etching of different materials with low uniformity (Si, SiO2, Photoresist, Polyimide, etc), Photoresist Residuals Removal, Photoresist Strip, and many others.
