Mask Etching with Plasma

PicoTech offers a wide range of Mask Etching Solutions for R&D and Pilot Production. These Dry Etch tools are suitable for single mask processing with manual or automated loading. Whether Cr, phase shift, or EUV mask materials are being used, Mask Etcher systems can handle the process with excellent uniformity and particle control while also maintaining high system production uptime and yields.

Process Highlights:

• Compensation for uniformity and loading effect
• Feature fidelity with low etch bias
• Low particle and defect
• Low line edge roughness (LER)