PicoTech offers classic Horizontal diffusion furnaces by SVCS. SVCS Horizontal diffusion furnaces are Designed for High Performance Production Environment while staying Efficient and Economic.
A variety of processes are available in Horizontal diffusion furnaces:
Atmospheric Processes:
- Diffusion (drive-in) high-temperature processes
- Doping from solid, liquid and gaseous dopant sources: BBr3, B2H6, POCL3, PH3, BN
- Various thermal processing: Annealing, Sintering
- Pyrogenic Wet Oxide with External Burning System
- Wet Oxide with ultra-pure steamer
- Dry Oxide
- HiPOx (High Pressure Oxide)
LPCVD Processes:
- Silicon nitride
- Low-temperature oxide (LTO)
- High-temperature oxide (HTO)
- TEOS oxide
- Polysilicon, with tilt/flat temperature profile
- Doped polysilicon
- Oxynitride
PECVD Processes:
- Silicon nitride (incl. anti-reflective SiN solar cell coating)
- Silicon oxide
- Oxinitride
DCE or HCl optional for all processes
