PicoTech offers Vertical Tube Diffusion Furnaces by SVCS. SVCS Vertical Tube Diffusion Furnaces are Designed for High Performance Production Environment while staying Efficient and Economic.
Scalable for Production or R&D Applications
SVCS Vertical Thermal Reactor (VTR) is designed for all standard atmospheric and low-pressure CVD processes. VTR is available with several lengths of flat zone for both mass production and R&D application. The single tube set-up with dual boat logistics is optimized for minimum down-time as well as low maintenance costs.
Atmospheric Processes:
- Diffusion (drive-in) high-temperature processes
- Doping from solid, liquid and gaseous dopant sources: BBr3, B2H6, POCL3, PH3, BN
- Various thermal processing: Annealing, Sintering
- Pyrogenic Wet Oxide with External Burning System
- Dry Oxide
LPCVD Processes:
- Silicon nitride / low-stress nitride
- Low-temperature oxide (LTO)
- High-temperature oxide (HTO)
- TEOS oxide
- Polysilicon, with tilt/flat temperature profile
- Doped polysilicon
- Oxynitride
DCE or HCl optional for all processes
