Fully-auto Rapid Thermal Processing (RTP)

PicoTech offers a wide range of Fully-auto RTP tools by Plasma-Therm for Rapid Thermal Processing and Rapid Thermal Annealing.

Rapid thermal processing (RTP) can be used in a multitude of semiconductor process steps, such as post-implant annealing, growth of oxide and nitride films, reflow, and formation of silicides, salicides, and metal alloys.

In a single-wafer chamber, wafers are rapidly heated and held at a closed-loop controlled temperature. The Heatpulse RTP system can process a variety of substrates, such as silicon, silicon carbide (SiC), gallium arsenide (GaAs), gallium nitride (GaN), quartz, and sapphire.