PicoTech offers a wide range of Rapid Thermal Processing and Rapid Thermal Annealing tools by UniTemp.
Semi-automatic RTP tools allow operation with wafers and samples up to 12”/ 300×300 mm. Heating technology is IR radiation (IR lamps) which allows RTP systems to reach very high heating speeds, up to 200 K/sec in EP versions of the machines and the temperature of 1200C. Internal parts and wafer holders can be made from quartz and graphite. Hi-vacuum process (down to 10-6 hPa) is available in HV versions of the machines.
Different RTP tools are available to process 100/150/200/300 mm wafers. Operation in gas environment and vacuum is possible.
Typical applications are:
Rapid Thermal Processing (RTP), Rapid Thermal Annealing (RTA), Atmospheric and Vacuum Annealing, Post-Implant Annealing, General Thermal Processing,
