PicoTech offers a wide range of Gridded RFICP Sources by Kaufman & Robinson.
The RFICP products produce a high density discharge without the use of filaments. The beam extracted from the discharge is precisely controlled to provide a defined shape, current density, and ion energy.
The RFICP products come in a comprehensive product package. The package is complete with components required to install and operate the RFICP products, including the RF inductively coupled RFICP ion source, application-specific ion optics, electron source neutralizer, power supply controller, vacuum feedthroughs, and cables.
Typical applications are:
Ion-beam-assisted deposition in thermal and e-beam evaporation (IBAD)
In-situ preclean in sputtering and evaporation (PC)
Surface modification and activation (SM)
Direct deposition of thin, hard, or functional coatings (DD)
Ion beam sputter deposition of single and multilayer structures (IBSD)
Ion beam etching of surface features in any material (IBE)
Ion beam tuning, and figuring of precision devices (IBF)
