PicoTech offers a wide range of Gridless End-Hall eH Sources by Kaufman & Robinson.
The eH products output a high current and a low energy beam. The ion current meets specifications for high process rates, while the low energy ion bombardment eliminates damage to surfaces and interfaces.
The compact, low-profile eH series is available in different sizes that cover both R&D and high-yield production requirements.
Typical applications are:
Ion-beam-assisted deposition in thermal and e-beam evaporation (IBAD)
Ion-beam-assisted deposition in magnetron sputtering (IBAD)
In-situ pre-clean in sputtering and evaporation (PC)
Surface modification and activation (SM)
Direct deposition of thin hard or functional coatings (DD)
Low-energy ion-beam etching (LIBE)
Biased target ion-beam sputter deposition (BTIBSD)
