PicoTech offers Hi-End Physical Vapor Deposition (PVD) tools for manufacturing and development of Power Devices, Wireless, LED, MEMS and Photonics.
Hi-End physical vapor deposition tools are suitable for wafer processing from pieces up to 300mm with single substrate loading or multiple substrates loading in bigger systems, depending on the model. Systems can operate in high vacuum or ultra-high vacuum environment. Automated wafer loading options are available for these systems.
The main advantage of Hi-End PVD tools is a very high uniformity and very high repeatability of deposited layers and thin film coatings.
Typical applications are:
High Uniformity Physical Vapor Deposition (PVD) of materials in R&D, low volume and high volume production. Thin film deposition, thin film coating development and manufacturing, including Semiconductors, Optical Coatings, Batteries, Biomedical and many others.
For example: E-Beam evaporation for lift-off, PVD for high-end Quantum Computing Devices, Optical Interference Filters, Multi-Layer Barrier Coatings, and Transparent Conductive Oxides (TCOs).
