Manual PVD for R&D: Thermal, Sputter, E-beam, IBD, Hybrid

PicoTech offers a wide range of Manual Physical Vapor Deposition (PVD) tools for R&D: Thermal, Sputter, E-beam Evaporation, Ion Beam Deposition (IBD), Ion Beam Sputtering (IBS), Organic Materials Evaporation. Several different technologies can be combined in a single chamber to fit almost any R&D needs.

These physical vapor deposition tools are suitable for wafer processing from pieces up to 200mm with single substrate loading or multiple substrates loading in bigger systems, depending on the model. Systems can operate in high vacuum or ultra-high vacuum environment.

 

Typical applications are:

Physical Vapor Deposition (PVD) of materials in R&D and laboratories. Thin film deposition and thin film coating development, including 3D batteries and Semiconductors, Optical Coatings and many others.

Sputtering and Evaporation of Metals, Dielectrics and other materials, different coatings including Precision Coatings for Optics, Indium Bumps formation, Protective Coatings.