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UHV linear transfer tunnel

PicoTech offers the MECATRANS Transfer Tunnels of UltraHigh Vacuum by Vinci Technologies.

MECATRANS Transfer Ultrahigh Vacuum Tunnels

The MECATRANS system marks a revolutionary development in thin films research and applied technology, embodying the forefront of materials science. It facilitates integrated workflow of deposition growth, analysis, sample preparation and post-deposition treatments systems all within a closed unique Ultrahigh Vacuum (UHV) environment.

It accommodates sample transport from system to system so that users can design materials from atomic/nano-scale all the way to macrostructures. Samples move through the UHV tunnel on an internal monorail, allowing for efficient exchanges between the sample carriage and connected chambers, equipped with vacuum valves and load locks for contamination-free transfer.

The MECATRANS is tailored to support several two, three or four inch sample platens, maximizing throughput and versatility in sample processing. A miniature version for the transport of solely small pieces such as flag-style (5×5, 5×10, 10x10mm) samples is also available.

* Ultra-High Vacuum Tunnels: Ensures 10 mbar vacuum tunnels, providing a pristine substrate transfer environment, crucial for minimizing contamination risks.
* Magnetic Coupling: Features friction-free movement via magnetic coupling, essential for eliminating particle contamination and ensuring a clean transfer within the vacuum chamber.
* Advanced Pumping Group: Incorporates ion pumps and turbomolecular pumps, maintaining optimal Ultrahigh Vacuum conditions.
* High-Capacity Transport: Heralds a train-carriage system capable of transporting up to several substrates simultaneously, utilizing load locks to enhance efficiency and maintain UHV integrity.
* Rapid Transport Speed: Achieves a high transport speed of 50 cm/s in manual operation, critical for reducing transfer time and increasing throughput in semiconductor equipment. Automation of transfer as an option.
* Durable Construction: Constructed from high-quality 304L/316L stainless steel, ensuring durability and resistance to high temperatures in UHV conditions.
* Versatile Substrate Holders: Supports two, three or four inch sample platens or special substrate holders, offering flexibility for a range of research requirements.
* High-Temperature Bakeout: Capable of 200°C bakeout temperature, facilitating thorough vacuum preparation and cleaning, supported by effective vacuum valves.
* Customizable Design: Provides customizable lengths to accommodate specific laboratory or research facility needs, integrating seamlessly with existing UHV systems.
* Low Maintenance: Designed for easy maintenance, significantly reducing downtime and operational costs, thanks to reliable vacuum valves and ion pumps.
* Automated Motion: Offers optional automated motion for the transfer train, enhancing ease of use and consistency in sample handling, an advantage for semiconductor equipment

UHV linear transfer tunnel

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