PicoTech offers a wide range of Fully-Automatic Mask Cleaners by Suss Microtec for production use.
Typical applications are:
Fully-Automated Photomask Processing Platforms are made for advanced Bake, Resist Strip & Clean and Develop processes in the semiconductors industry.
The ASx series is SUSS MicroTec’s fully-automated photomask processing platform for 250 nm to 65 nm technology nodes with advanced bake (qualified down to 14 nm node and beyond), clean, develop and etch technologies. The series offers reliability, stability and performance to meet critical challenges of defect-free processing of masks exposed to 248 nm and 193 nm lithography.
Next-Generation Lithography for Photomask Clean, Bake and Develop
MaskTrack Pro solves next-generation lithography roadmap requirements for photomask cleaning, bake and developing. MaskTrack Pro is designed to balance the most stringent conditions of 193i 1x nm half-pitch (hp) DPT, extreme-ultraviolet lithography (EUVL) and nanomprint lithography (NIL) processing with innovative techniques to maximize mask performance.
